CIMdata PLM Industry Summary Online Archive

8 January 2008

Implementation Investments

Agilent Technologies Announces that STMicroelectronics has Standardized on Agilent's RF Momentum Electromagnetic Simulator

Agilent Technologies Inc. announced that STMicroelectronics, a global provider of semiconductor solutions for microelectronics applications, has standardized on Agilent's Momentum electromagnetic (EM) simulator as part of its RFIC design process. This integration will speed and streamline STMicroelectronics' RFIC design flow.

"We have a long-standing relationship with STMicroelectronics that began several years ago with their adoption of Agilent's EDA platforms and tools, including our RF Design Environment," said Claudette Venet, Europe sales manager with Agilent's EEsof EDA division. "They have been a key participant in our Early Access Program, providing valuable guidance to our development team and resulting in an EM tool that meets the company's high standards. I am pleased that our work together will help improve STMicroelectronics' design flow and fuel its continued growth and success."

"When Agilent developed its Momentum solution, they listened to our request for tools interoperability and quickly responded with a best-in-class RFIC design flow," said Philippe Magarshack, vice president, front-end technology manufacturing, STMicroelectronics. "Standardizing on Momentum will increase our designers' productivity and flexibility, and reduce time-to-tape-out for new CMOS-based RF designs."

Agilent Momentum is a 3-D planar EM simulator that combines full-wave and quasi-static EM solvers for passive, interconnect and parasitic modeling. For RFIC design it reduces simulation time without sacrificing accuracy on large structures under a half wavelength. It accepts arbitrary design geometries and accurately simulates complex EM effects including skin effect, substrate effect, thick metal effect and multiple dielectrics.

Agilent Momentum's latest enhancements, along with the joint effort of the two companies to completely integrate it into the Cadence-based design flow allows STMicroelectronics designers to perform optimum modeling on interconnect and complex spiral inductors on complementary metal-oxide-semiconductor (CMOS) processes such as HCMOS9 and CMOS65.

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