CIMdata PLM Industry Summary Online Archive
18 January 2007
Product News
Lectra Unveils Modaris 3D Fit, the Most Powerful Virtual Prototyping Solution in the Apparel Industry
Lectra announced the release of Modaris 3D Fit, its state-of-the-art 3D virtual prototyping solution for pattern makers, designers, product developers, and marketing and sales teams.
The integration of 3D prototyping and product visualization into the collections development and marketing cycle will enable apparel professionals to shorten lead times and reduce development costs while facilitating collaborative work and decision making between all participants involved.
Prototyping as a key factor in the success of a collection
"More than half of a garment's cost depends on decisions made during the design and development phase. Thus, prototyping plays an important part in the success of a collection," according to Astrid Marlier, Lectra's product manager for pattern making and marker making for the fashion market. "Modaris 3D Fit provides fashion companies with an additional competitive advantage."
Modaris 3D Fit represents a major CAD breakthrough. This innovative solution will help reduce the number of physical prototypes required and facilitate communication inside the company and between brands and subcontractors, regardless of their number and location.
Control and validation of garment design and fit, and collections content
Associating fabric information (with a library of 120 fabrics and their mechanical characteristics), 2D patterns, and 3D virtual mannequins (standard and configurable), Modaris 3D Fit enables simulation and realistic visualization of three-dimensional garments, with their various fabrics, motifs and color ranges. It allows garment fits to be checked for ease, balance, sewing lines, proportions in various fabrics and sizes, and the fine-tuning of product specifications. Taking into account the creative constraints of the designer and the production constraints of the pattern maker, Modaris 3D Fit optimizes the review of virtual prototypes and decision making prior to realization of physical prototypes.
Modaris 3D Fit, which has undergone conclusive testing in its different applications for women, men and children, will be released in February 2007. This innovation is the outcome of eight years of research and development, and capitalizes on more than 30 years of experience that Lectra has acquired in the worldwide fashion market and its various businesses. It also demonstrates Lectra's unique and thorough knowledge of human body measurement and 3D representation, as well as fabrics.
A value-added solution associated with expert services
In line with Lectra's strategy of accompanying its customers in "project mode," Modaris 3D Fit will be coupled with expert services. These services-such as customer process audit and additional parameter-setting sessions on fabric characterization and specific 3D mannequins-are all supported by Lectra's solutions experts and consultants.
Paired with Lectra's world-renowned pattern-design solutions (Modaris and PGS), Modaris 3D Fit enables apparel professionals to manage the constant acceleration of collections and customization of styles. Modaris 3D Fit completes Lectra's offering for design, development, manufacturing and product lifecycle management (PLM).
A solution that highlights Lectra's strategy
"Technology-and from now on 3D-is a key to stimulating the fashion sector," said Daniel Harari, Lectra's CEO. "By evolving each of our business applications, such as our product development and pattern-making solutions, in close partnership with our customers, Lectra demonstrates its ongoing commitment to fashion companies, around the world, to respond to their strategic challenges and ensure their success."
Become a member of the CIMdata PLM Community to receive your daily PLM news and much more.
Tell us what you think of the CIMdata Newsletter. Send your feedback.
CIMdata is committed to your privacy. Your personal information will never be sold or shared outside of CIMdata without your express permission.