CIMdata PLM Industry Summary Online Archive
12 June 2007
Product News
Synopsys and Hitachi High-Technologies Deliver Enhanced OPC Modeling Speed, Accuracy and Predictability
Synopsys, Inc . and Hitachi High-Technologies Corp . announced that they have developed a seamless link between Hitachi High-Tech's DesignGauge design data measuring system and Synopsys' Proteus optical proximity correction (OPC) solution. Focused on incorporating manufacturing-aware metrology data into design, this common design for manufacturing (DFM) interface helps mutual customers to develop faster, more accurate and predictive OPC models for advanced 45 nanometer (nm) and beyond technologies. Moreover, Proteus customers can achieve higher OPC model predictability and reduced model-building cycle time.
As process geometries continue to shrink to 45-nm and beyond, the ability to deliver accurate OPC models that meet the stringent critical-dimension (CD) error budget across the process window plays an increasingly critical role in accelerating mask time-to-yield. Process window models must account for the wide range of process variation and complex two-dimensional (2D) structures. This becomes even more important with the use of multiple resolution enhancement techniques (RETs) for advanced semiconductor manufacturing.
The automated algorithmic link between DesignGauge, the application system for CD scanning electron microscopy (CD-SEM), and Proteus OPC for pre-processing OPC model building data allows Proteus customers to seamlessly obtain a large sampling of metrology data to account for process variations across the entire process window. This new functionality is available in the latest production release of Proteus.
"Working with a DFM world leader like Synopsys is invaluable in helping us to provide enhanced OPC modeling performance for our customers," said Aritoshi Sugimoto, general manager, Marketing & Planning Division, Semiconductor Equipment Business Group, Hitachi High-Technologies. "The accuracy and predictability of OPC models can be significantly improved by incorporating our unique DesignGauge CD-SEM data into the Proteus OPC tool."
"Proteus OPC has been in production for 10 years over seven consecutive technology nodes, delivering software performance improvement year over year. Combining leading-edge metrology information from Hitachi High-Tech with Proteus mask-synthesis data sharpens OPC model accuracy and predictability at 45 nanometers and beyond," said Anantha Sethuraman, vice president of marketing, Design for Manufacturing, Synopsys. "The result will be that customers are better able to achieve their model production and yield goals, ultimately reducing their overall cost of ownership."
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