CIMdata PLM Industry Summary Online Archive
4 January 2007
Product News
Magma and UMC Complete 65-nm Library Characterization Effort
Magma® Design Automation Inc., a provider of semiconductor design software, announced that UMC , a world-leading semiconductor foundry, has characterized its internally developed libraries for 65-nanometer (nm) and smaller process geometries using Magma's SiliconSmartT. The libraries support composite current source (CCS), effective current source model (ECSM) format and are developed to give customers timing and noise enhancements in their nanometer designs.
"UMC's 65-nm production technology is seeing widespread acceptance among customers that span across a wide range of applications," said Ken Liou, director of the IP Development and Design Support division at UMC. "To ease customer design-in for this leading-edge technology, we are constantly developing valuable design support resources that will help customers speed their product time to market. Using Magma's SiliconSmart to characterize our 65-nm libraries has enabled us to deliver comprehensive libraries characterized by faster throughput, better accuracy and more automation. We look forward to continuing our work with Magma to expand our design support solutions that address issues such as advanced timing, power, noise and design for manufacturability models."
"UMC's large and varied customer base requires that they maintain accurate libraries and rapidly characterize them at a number of process and performance variations," said Suk Lee, general manager of Magma's Custom Design Business Unit. "SiliconSmart's superior throughput, high degree of automation, high performance and reliable support is designed to suit these needs."
About SiliconSmart
SiliconSmart is a complete library characterization and publishing system that produces production-ready models with minimal setup effort. Setup is automated for most complex cells and IOs while an easy-to-use Tcl interface is available for customization. SiliconSmart offers an industry-leading track record for accuracy and usability of characterized models over a comprehensive set of model formats and EDA design flows - and is also backed by dependable worldwide customer support.
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