CIMdata PLM Industry Summary Online Archive

7 November 2005

Product News

Synopsys Galaxy Design Platform Now Supports Composite Current Source Modeling Technology

Synopsys, Inc. announced Synopsys GalaxyT Design Platform support for Composite Current Source (CCS) modeling technology. The unified CCS model extends the analysis and optimization capabilities within the Galaxy Design Platform to concurrently address nanometer effects and thereby reduce design margins and minimizing iterations.

"Using the CCS library models with the Galaxy Design Platform allows our customers to reduce design margins and improve productivity by taking advantage of the new voltage scaling and IR-Drop delay analysis capabilities," said Nobuyuki Nishiguchi, vice president, general manager, Development Department 1, Design Methodology Group, STARC. "With our continued collaboration with Synopsys, we have incorporated CCS modeling technology into our STARCAD-21 Synopsys-based production flow Version 2.5."

The CCS modeling technology offers a unified solution to account accurately and efficiently for important new effects in timing, noise and power that become significant in designs at 90-nanometers (nm) and below. Having to account for these nanometer effects by adding design margins leads to over-design and extra iterations that can significantly impact designer productivity. The Galaxy Design Platform is an open, integrated design implementation platform with industry-leading tools that can now take advantage of the comprehensive CCS modeling technology and help eliminate the need for extra design margins and speed design closure.

"Efficient design at 90 nanometers and below requires not only accurate nanometer modeling technology but also a world-class design platform that can fully utilize the capabilities of these models," said Antun Domic, senior vice president and general manager of Synopsys' Implementation Group. "With the combination of CCS modeling technology and the Galaxy Design Platform, Synopsys is leading the industry by providing the next leap in designer productivity."

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